Based　on　the　nanoimprint　lithography　(NIL)　combining　with　layered　manufacture　principle,　a　novel　three-dimensional　micro-electronic　mechanical　system　(MEMS)　fabrication　process　is　investigated.　To　accurately　align　the　individual　layers,　an　optical　alignment　system　with　video　image　principle　is　developed　to　improve　the　alignment　accuracy　to　2　μm.　The　photoresist　with　high　resolution　is　made　by　reducing　the　viscosity　and　the　solidification　contraction　ratio　when　the　elasticity　and　solidification　velocity　are　taken　into　account.　Experiments　are　performed　to　optimize　the　process　parameters　of　resist-coating,　imprinting　and　template-separation,　and　the　atomic　force　microscope　(AFM)　images　of　imprinting　results　show　that　the　pattern　replication　error　from　mold　to　photoresist　is　less　than　8%,　which　enables　to　manufacture　complicated　microstructures　with　higher　efficiency　and　lower　cost　for　MEMS　device　fabrication.